Tech Xplore on MSN

New semiconductor etching process achieves five-fold speed improvement

After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...
AZOM

Bosch Process for Etching Micro-Mechanical Systems (MEMS)

The fundamentals of a good Bosch etching system are described below; There are a number of significant features of the equipment used for Bosch processing which differ from normal ICP systems: In ...
Semiconductor Engineering

Cryogenic Etch: A Key Enabler Of 3D NAND

Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...
Semiconductor Engineering

Cryogenic Etch Re-Emerges

After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...
AZOM

Selective Reactive Ion Etching of P-Doped Polysilicon Using a Cl2/HBr Mixture

A standard 13.56 MHz driven parallel plate reactive ion etcher (Trion Technology Minilock II), which allows internal anodization for use with chlorine was utilized for this experiment. Some features ...
American Machinist

Photochemical Etching – and How It’s Done

Photochemical etching is a machining technique that leverages the principles behind photography to shape a piece of sheet metal and turn it into a finished product or component. The modern form of ...
EDN

Voltage controls etching process

With photolithography not able to produce circuit lines much thinner than 100nm, a major focus of research into nanotechnology is in developing means to construct circuits that break the 100nm barrier ...