A technical paper titled “A Review of the Recent Developments in the Fabrication Processes of CMOS Image Sensors for Smartphones” was published by researchers at Texas A&M University. “CMOS Image ...
Fabless semiconductor company Luxtera announced today that it has solved the longstanding problem of building advanced photonic interfaces into mass-produced silicon chips. The company claimed that, ...
Engineers at IBM Research are claiming to have built the world's most advanced graphene-based computer chip, with performance that's 10,000 times better than previous graphene ICs. The key to the ...
TOKYO — Toshiba Corp. has developed a CMOS transistor that uses a gate dielectric of nitrided hafnium silicate (HfSiON) and plans to move it into mass production in 2005 at the 65-nanometer ...
Two major semiconductor players have unwrapped plans to ramp up production in the 0.13-µm (130-nm) CMOS process. Combining innovations in copper wiring, silicon-on-insulator (SOI) transistors, and ...
A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
NEWPORT BEACH, Calif.–Conexant Systems Inc. today announced it will accelerate its shift away from digital CMOS manufacturing. The company also announced it was restructuring its manufacturing ...